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Proceedings Paper

Materials study for technically relevant devices fabricated by excimer ablation lithography
Author(s): Christina Hahn; Thilo Kunz; Alexander J. Wokaun
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Paper Abstract

As polymers tailored for laser ablation at a specific wavelength usually require a costly synthesis that makes them expensive, standard materials are investigated in the present study that are already produced on a large scale. Apart from an absorption band around the laser wavelength (here, 308 nm) further properties are important in technical applications, such as thermal and photochemical stability or optical transparency. High etching rates combined with high quality structuring are required for photon-efficient ablation. Depending on these criteria we chose several standard materials, which are commercially available, and characterized the ablation behavior. The substrates include polymers such as polycarbonates, polymer blends, and in addition glassy carbon substrates, which are wide-spread in industrial appliances already and promising for devices fabricated by excimer ablation lithography. The characteristic parameters were determined and the quality of the obtained structure was investigated by scanning-electron- and atomic-force-microscopy. Examples of applications in microtechnology will be shown.

Paper Details

Date Published: 3 June 1998
PDF: 7 pages
Proc. SPIE 3274, Laser Applications in Microelectronic and Optoelectronic Manufacturing III, (3 June 1998); doi: 10.1117/12.309516
Show Author Affiliations
Christina Hahn, Paul Scherrer Institute (Switzerland)
Thilo Kunz, Paul Scherrer Institute (Switzerland)
Alexander J. Wokaun, Paul Scherrer Institute (Switzerland) and Swiss Federal Institute of Technolgy (Switzerland)

Published in SPIE Proceedings Vol. 3274:
Laser Applications in Microelectronic and Optoelectronic Manufacturing III
Jan J. Dubowski; Peter E. Dyer, Editor(s)

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