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Proceedings Paper

Transmission polarizing beam-splitter grating for reconfigurable optical interconnects
Author(s): Jerome Hazart; Philippe Lalanne; Pierre H. Chavel; Edmond Cambril; Huguette Launois
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Paper Abstract

We present the design, fabrication, and test of a 90 degree(s) polarizing beam splitter grating for 633 nm. This component is compact and its fabrication is reproducible enough to be integrated in optical reconfigurable interconnect systems. For TE polarization, the incident beam is undeflected whereas TM beams exhibit a 90 degrees deviation. We used electromagnetic vector theory to optimize diffraction efficiencies and the extinction ratio. We employed direct electron beam writing and reactive ion etching to fabricate a polarizing beam splitter etched in a photoresist layer deposited on a fused silica substrate.

Paper Details

Date Published: 22 May 1998
PDF: 4 pages
Proc. SPIE 3490, Optics in Computing '98, (22 May 1998); doi: 10.1117/12.308875
Show Author Affiliations
Jerome Hazart, Univ. d'Orsay (France)
Philippe Lalanne, Univ. d'Orsay (France)
Pierre H. Chavel, Univ. d'Orsay (France)
Edmond Cambril, CNRS (France)
Huguette Launois, CNRS (France)


Published in SPIE Proceedings Vol. 3490:
Optics in Computing '98
Pierre H. Chavel; David A. B. Miller; Hugo Thienpont, Editor(s)

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