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Proceedings Paper

Application of scanning thermal microscopy to the study of thermophysical properties of ultrathin photoresist films
Author(s): Fernando A. Escobedo; David S. Fryer; Juan J. de Pablo
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Paper Abstract

Monte-Carlo simulation methods are used to investigate the glass transition temperature measurements from a scanning thermal microscopy study of thin photoresist films. We find that, consistent with our own experimental observations, film thickness has a profound effect on the glass transition temperature. Depending on whether the film is confined or not, we observe an increase or a decrease of the glass transition temperature. These findings are explained in terms of structural changes occurring at the molecular level.

Paper Details

Date Published: 8 June 1998
PDF: 6 pages
Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308791
Show Author Affiliations
Fernando A. Escobedo, Univ. of Wisconsin/Madison (United States)
David S. Fryer, Univ. of Wisconsin/Madison (United States)
Juan J. de Pablo, Univ. of Wisconsin/Madison (United States)

Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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