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Proceedings Paper

Trace contaminants from photoresist materials by modern spectrometry determination
Author(s): Dumitru Gh. Ulieru
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Paper Abstract

The modern semiconductor manufacturing used advanced photoresists chemicals with extremely low levels of trace metallic contaminants. The use of Inductively Coupled Plasma Spectrometry (ICP-MS) allows for the rapid analysis of these chemicals with sensitivity similar to furnace atomic absorption and with minimal sample preparation. Sample introduction methods currently being used include ultrasonic nebulization (USN) and electrothermal vaporization (ETV).

Paper Details

Date Published: 8 June 1998
PDF: 6 pages
Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308786
Show Author Affiliations
Dumitru Gh. Ulieru, ROMES SA (Romania)

Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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