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Proceedings Paper

Monte Carlo simulations of electron-beam/solid interactions as an aid in interpretation of EDS and auger analysis of particles and defects
Author(s): Jeffrey R. Kingsley; David W. Harris
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Paper Abstract

In this study we model the interaction of an electron beam with small (less than 0.5 microns) particles in order to understand the limitations and advantages of several analytical techniques. From this study we see that both Auger and EDS have advantages depending on particle size and desired information. In general, lower voltage is favored for small particle analysis by EDS, while high voltage gives the best small particle results with Auger.

Paper Details

Date Published: 8 June 1998
PDF: 7 pages
Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308760
Show Author Affiliations
Jeffrey R. Kingsley, Charles Evans & Associates (United States)
David W. Harris, Charles Evans & Associates (United States)


Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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