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Proceedings Paper

Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates
Author(s): Brian Martin; Graham G. Arthur; Christine Wallace
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Paper Abstract

This paper investigates photoresist profiles on low reflectivity substrates with respect to numerical aperture and position in lens field. Results suggest a link between resist wall angle and substrate reflectivity which is influenced by lens aberrations.

Paper Details

Date Published: 8 June 1998
PDF: 12 pages
Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308746
Show Author Affiliations
Brian Martin, GEC Plessey Semiconductors Ltd. (United Kingdom)
Graham G. Arthur, Rutherford Appleton Lab. (United Kingdom)
Christine Wallace, GEC Plessey Semiconductors Ltd. (France)


Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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