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Proceedings Paper

Defect inspection of zero E-field border on i-line 9% PSM
Author(s): Jerry Xiaoming Chen; Franklin D. Kalk
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Paper Abstract

In the photomask process, Zero E-field borders have been used on attenuated/embedded phase shift masks to provide an opaque area around the die area in the mask industry, but this border has never been able to be inspected on a laser scan inspection tool. This paper reports the first time that the Zero E-field has been inspected at DuPont Photomasks, Reticle Technology Center.

Paper Details

Date Published: 8 June 1998
PDF: 7 pages
Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308741
Show Author Affiliations
Jerry Xiaoming Chen, Dupont Photomasks Inc. (United States)
Franklin D. Kalk, Dupont Photomasks Inc. (United States)

Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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