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Proceedings Paper

Toward a unified advanced CD-SEM specification for sub-0.18-um technology
Author(s): John A. Allgair; Charles N. Archie; G. William Banke; E. Hal Bogardus; Joseph E. Griffith; Herschel M. Marchman; Michael T. Postek; Lumdas H. Saraf; Jerry E. Schlesinger; Bhanwar Singh; Neal T. Sullivan; Lee E. Trimble; Andras E. Vladar; Arnold W. Yanof
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Paper Abstract

The stringent critical dimension control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope specification in the interests of providing a unified criterion of performance and testing. The specification is grounded on standard definitions and strong principles of metrology. The current revision is to be published as a SEMATECH document. A new revision, now in progress, will embody the consensus of a vendor/user conference.

Paper Details

Date Published: 8 June 1998
PDF: 13 pages
Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308724
Show Author Affiliations
John A. Allgair, Motorola (United States)
Charles N. Archie, IBM Corp. (United States)
G. William Banke, IBM Corp. (United States)
E. Hal Bogardus, SEMATECH (United States)
Joseph E. Griffith, Lucent Technologies/Bell Labs. (United States)
Herschel M. Marchman, Texas Instruments Inc. (United States)
Michael T. Postek, National Institute of Standards and Technology (United States)
Lumdas H. Saraf, SEMATECH (United States)
Jerry E. Schlesinger, Texas Instruments Inc. (United States)
Bhanwar Singh, Advanced Micro Devices, Inc. (United States)
Neal T. Sullivan, Digital Equipment Corp. (United States)
Lee E. Trimble, Lucent Technologies/Bell Labs. (United States)
Andras E. Vladar, Hewlett-Packard Co. (United States)
Arnold W. Yanof, Motorola (United States)

Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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