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Proceedings Paper

Measuring the size and intensity distribution of SEM beam spot
Author(s): Alex Goldenshtein; Yaron I. Gold; Haim Chayet
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Paper Abstract

In this paper, a method for measuring the SEM electron beam spot profile is reported: a thin (1 micrometer) film aperture is used as a knife-edge target, and scanned at high magnification. The derivative of the detected signal is proportional to the spot cross section width. High contrast is achieved at the edge of the aperture hole, because the hole boundary is well-defined and because the electron yield is zero inside the hole. Therefore, the measurement is independent of detection efficiency, electron collection and electron-material interaction. A non-zero spot size results in image blurring and reduced resolution. Knowledge of spot size and intensity distribution may be used, as in the Opal 7830Si, for countering this effect. Monitoring spot characteristics may also be used for diagnostic purposes, such as detecting astigmatism or misalignment.

Paper Details

Date Published: 8 June 1998
PDF: 6 pages
Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308723
Show Author Affiliations
Alex Goldenshtein, Applied Materials, Inc./Opal (Israel)
Yaron I. Gold, Applied Materials, Inc./Opal (Israel)
Haim Chayet, Applied Materials, Inc./Opal (Israel)


Published in SPIE Proceedings Vol. 3332:
Metrology, Inspection, and Process Control for Microlithography XII
Bhanwar Singh, Editor(s)

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