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Proceedings Paper

Ablation dynamic studies of polymers with a coherent VUV source at 125 nm
Author(s): D. Riedel; M. C. Castex
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Paper Abstract

First demonstration is given here about the use of a VUV coherent source at 125 nm for efficient and clean etching of polytetrafluoroethylene PTFE and poly(methyl methacrylate) PMMA polymers. Measurements of etch rate as a function of fluence and number of shots are presented and compared with previous works using 157 nm (F2 laser) and 193 nm (ArF laser). Experimental results are presented and physical approach is made with classical Beer-Lambert's absorption law and discussed.

Paper Details

Date Published: 26 May 1998
PDF: 9 pages
Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); doi: 10.1117/12.308622
Show Author Affiliations
D. Riedel, Univ. Paris-Nord (France)
M. C. Castex, Univ. Paris-Nord (France)

Published in SPIE Proceedings Vol. 3404:
ALT'97 International Conference on Laser Surface Processing
Vladimir I. Pustovoy, Editor(s)

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