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Proceedings Paper

Deposition of dielectric PLT thin film by laser ablation
Author(s): Dong Seog Eun; Joo Hyung Park; Jeong Heum Park; Sang Yeol Lee; Chang Yub Park
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Paper Abstract

Lead-based ferroelectric thin films offer a wide variety of applications in dielectric, piezoelectric, pyroelectric, electro-optic, and memory devices. Among many applications, Pb-based thin films are suitable for increasing the integration of DRAM due to high relative dielectric constant. Thin films of PLT(28) Pb0.72La0.28Ti0.93O3) have been deposited on Pt/Ti/SiO2/Si substrates in situ by a laser ablation. We have systematically investigated the effect of deposition temperatures on the crystal structures and the electrical property of the films. The temperature has been varied from 500 degree(s)C to 700 degree(s)C. The crystal structures and the electrical properties of the thin films have been observed to strongly depend on the deposition temperature by C-V measurement, scanning electron microscopy, and X-ray diffraction method.

Paper Details

Date Published: 26 May 1998
PDF: 6 pages
Proc. SPIE 3404, ALT'97 International Conference on Laser Surface Processing, (26 May 1998); doi: 10.1117/12.308597
Show Author Affiliations
Dong Seog Eun, Yonsei Univ. (South Korea)
Joo Hyung Park, Yonsei Univ. (South Korea)
Jeong Heum Park, Yonsei Univ. (South Korea)
Sang Yeol Lee, Yonsei Univ. (South Korea)
Chang Yub Park, Yonsei Univ. (South Korea)


Published in SPIE Proceedings Vol. 3404:
ALT'97 International Conference on Laser Surface Processing
Vladimir I. Pustovoy, Editor(s)

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