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Proceedings Paper

Compact solid state UV laser for photochemistry and materials processing
Author(s): Andrew H. Kung; Poe-Jou Chen; Lee Jr-i; Jaya Sharma; Hai-Lung Dai
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Paper Abstract

We describe the design and performance of an all solid state uv laser source that produces several hundred milliwatts at 266 nm and up to one hundred milliwatts at 213 nm. Examples of using this source to ablate borosilicate glass and to expose (beta) -chloroethyl silsequioxane on silicon are discussed.

Paper Details

Date Published: 30 April 1998
PDF: 5 pages
Proc. SPIE 3272, Laser Techniques for Surface Science III, (30 April 1998); doi: 10.1117/12.307140
Show Author Affiliations
Andrew H. Kung, Institute of Atomic and Molecular Sciences (Taiwan)
Poe-Jou Chen, Institute of Atomic and Molecular Sciences (Taiwan)
Lee Jr-i, Institute of Atomic and Molecular Sciences (Taiwan)
Jaya Sharma, Univ. of Pennsylvania (United States)
Hai-Lung Dai, Univ. of Pennsylvania (United States)


Published in SPIE Proceedings Vol. 3272:
Laser Techniques for Surface Science III
Hai-Lung Dai; Hans-Joachim Freund, Editor(s)

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