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Proceedings Paper

Effects of polishing, etching, cleaving, and water leaching on the UV laser damage of fused silica
Author(s): J. M. Yoshiyama; Francois Y. Genin; Alberto Salleo; Ian M. Thomas; Mark R. Kozlowski; Lynn Matthew Sheehan; Ian D. Hutcheon; David W. Camp
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Paper Abstract

A damage morphology study was performed with a 355 nm, 8-ns Nd:YAG laser on synthetic UV-grade fused silica to determine the effects of post-polish chemical etching on laser-induced damage, compare damage morphologies of cleaved and polished surfaces, and understand the effects of the hydrolyzed surface layer and water-crack interactions. The samples were polished, then chemically etched in a buffered HF solution to remove 45, 90, 135, and 180 nm of surface material. Another set of sample was cleaved and soaked in boiling distilled water for 1 second and 1 hour. All the samples were irradiated at damaging fluences and characterized by Normarski optical microscopy and scanning electron microscope. Damage was initiated at micro-pits on both input and output surface of the polished fused silica sample. At higher fluences, the micro-pits generated cracks on the surface. Laser damage of the etched fused silica surface shoed that the real density of micro-pits decreased with etched thickness. SIMS analysis of the polished surface showed significant trace contamination levels within a 50 nm surface layer. Micro-pits formation also appeared after irradiating cleaved fused silica surfaces at damaging fluences. Linear damage tracks corresponding cleaving cracks were often observed on cleaved surfaces. Soaking cleaved samples in water produced wide laser damage tracks.

Paper Details

Date Published: 20 April 1998
PDF: 10 pages
Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.307041
Show Author Affiliations
J. M. Yoshiyama, Lawrence Livermore National Lab. (United States)
Francois Y. Genin, Lawrence Livermore National Lab. (United States)
Alberto Salleo, Lawrence Livermore National Lab. (United States)
Ian M. Thomas, Lawrence Livermore National Lab. (United States)
Mark R. Kozlowski, Lawrence Livermore National Lab. (United States)
Lynn Matthew Sheehan, Lawrence Livermore National Lab. (United States)
Ian D. Hutcheon, Lawrence Livermore National Lab. (United States)
David W. Camp, Lawrence Livermore National Lab. (United States)


Published in SPIE Proceedings Vol. 3244:
Laser-Induced Damage in Optical Materials: 1997
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; M. J. Soileau, Editor(s)

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