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Proceedings Paper

Microstructural size effects on the dielectric response of inhomogeneous media
Author(s): Kim F. Ferris; Larry A. Chick; Gregory J. Exarhos; Steven M. Risser
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Paper Abstract

The microstructure of dielectric films is an inherent characteristic of the fabrication process, and imposes distinctive behavior on the electric field distributions in these inhomogeneous media. In this paper, we examine the size dependent problem for cubic defects for an Al2O3 dielectric material. Using the LOCALF method to analyze the electric field response, we have developed models for Al2O3 dielectric films of varying microstructure size and volume fraction, and compare these results with conventional effective medium methods. Besides the dielectric susceptibility and volume fraction dependencies, the physical size of the heterogeneities creates localized regions of high field intensity.

Paper Details

Date Published: 20 April 1998
PDF: 7 pages
Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.307009
Show Author Affiliations
Kim F. Ferris, Pacific Northwest National Lab. (United States)
Larry A. Chick, Pacific Northwest National Lab. (United States)
Gregory J. Exarhos, Pacific Northwest National Lab. (United States)
Steven M. Risser, Texas A & M Univ. (United States)


Published in SPIE Proceedings Vol. 3244:
Laser-Induced Damage in Optical Materials: 1997
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; M. J. Soileau, Editor(s)

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