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Proceedings Paper

Improvement of laser-induced surface damage in CsLiB6O10 crystal by ion etching
Author(s): Tomosumi Kamimura; Masashi Yoshimura; Takahiro Inoue; Yusuke Mori; Takatomo Sasaki; Hidetsugu Yoshida; Masahiro Nakatsuka; Kunio Yoshida; Kyoichi Deki; Masahiro Horiguchi
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Paper Abstract

This paper investigates ion etching process to the surface of CsLiB6O10 (CLBO) crystal. Laser-induced surface damage was reduced and surface durability of CLBO crystal was improved by removing the subsurface embedded polishing compound. There was no surface degradation as a result of the ion etching. The effects of ion etching on surface damage were measured by a 1-on-1 test at a laser wavelength of 266 nm. Durability of the CLBO crystal was tested by the approximately 7 W fourth harmonic generated by a Nd:YAG laser. The durability of the ion etched surface was improved more than 10 times as compared with the as-polished surface.

Paper Details

Date Published: 20 April 1998
PDF: 6 pages
Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.307000
Show Author Affiliations
Tomosumi Kamimura, Osaka Univ. (Japan)
Masashi Yoshimura, Osaka Univ. (Japan)
Takahiro Inoue, Osaka Univ. (Japan)
Yusuke Mori, Osaka Univ. (Japan)
Takatomo Sasaki, Osaka Univ. (Japan)
Hidetsugu Yoshida, Osaka Univ. (Japan)
Masahiro Nakatsuka, Osaka Univ. (Japan)
Kunio Yoshida, Osaka Institute of Technology (Japan)
Kyoichi Deki, USHIO Inc. (Japan)
Masahiro Horiguchi, USHIO Inc. (Japan)


Published in SPIE Proceedings Vol. 3244:
Laser-Induced Damage in Optical Materials: 1997
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; M. J. Soileau, Editor(s)

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