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Proceedings Paper

Wavelength dependence of laser-induced damage in fused silica and fused quartz
Author(s): Kunio Yoshida; Nobuhiro Umemura; Nobu Kuzuu; Hidetsugu Yoshida; Tomosumi Kamimura; Takatomo Sasaki
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Paper Abstract

Laser-induced damage threshold (LIDT) of various types of vitreous silica at 1064, 532, 355 and 266 nm was investigated. At 1064 nm no difference of LIDT was observed for all samples. At 1064-355 nm, wavelength-dependence of LIDT of synthetic fused silica (SFS) can be well described by a relation Ith equals 1.45 (lambda) 0.43, where Ith is LIDT in J/cm2 and (lambda) is wavelength in nm. At 266 nm, however, LIDTs were smaller than a half of the calculated value from above relation. This difference can be explained by the damage mechanism; at 266 nm, two-photon absorption-induced defects lowered the LIDT same as a KrF-excimer-laser induced defects, whereas at longer wavelengths two photon process does not occur. LIDTs of fused quartz (FQ) at 532 and 355 nm, and that of a SFS containing about 1000 ppm of Cl and no OH at 355 nm were a little lower than that of the other SFSs. This may be related to the absorption of metallic impurities contained in FQ and dissolved Cl2 molecule in SFS.

Paper Details

Date Published: 20 April 1998
PDF: 12 pages
Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.306979
Show Author Affiliations
Kunio Yoshida, Osaka Institute of Technology (Japan)
Nobuhiro Umemura, Osaka Institute of Technology (Japan)
Nobu Kuzuu, Fukui Univ. (Japan)
Hidetsugu Yoshida, Osaka Univ. (Japan)
Tomosumi Kamimura, Osaka Univ. (Japan)
Takatomo Sasaki, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 3244:
Laser-Induced Damage in Optical Materials: 1997
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; M. J. Soileau, Editor(s)

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