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Proceedings Paper

Waveguide losses by photothermal techniques in multilayers for laser damage investigation
Author(s): M. Ranier; Patricia Volto; Gerard Albrand; Jean-Yves Natoli; Claude Amra; B. Pinot; Bernard Geenen
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Paper Abstract

Accurate characterization of losses in optical multilayers remains critical for laser damage investigation. In particular, due to time deposition and shift of deposition parameters, materials within multilayers have different intrinsic properties according to their vertical location within the stack. For this reason, different extinction coefficients can be found for materials in single layer forms and materials confined in multilayers. Therefore a non- destructive probe is required that should permit to characterize separately each interface or each bulk of a multilayer. This probe is offered by guided wave and photothermal techniques that we present in this paper. Our technique allows us to measure loss anomalies in multilayer waveguides by recording an attenuation coefficient for each propagation mode, as well as a temperature distribution perpendicular to the mode direction. The results are analyzed to determine dissipate properties versus z-location within the stacks. At this step an attempt is made to correlate damage with loss anomalies.

Paper Details

Date Published: 20 April 1998
PDF: 7 pages
Proc. SPIE 3244, Laser-Induced Damage in Optical Materials: 1997, (20 April 1998); doi: 10.1117/12.306970
Show Author Affiliations
M. Ranier, Ecole Nationale Superieure de Physique de Marseille (France)
Patricia Volto, Ecole Nationale Superieure de Physique de Marseille (France)
Gerard Albrand, Ecole Nationale Superieure de Physique de Marseille (France)
Jean-Yves Natoli, Ecole Nationale Superieure de Physique de Marseille (France)
Claude Amra, Ecole Nationale Superieure de Physique de Marseille (France)
B. Pinot, REOSC (France)
Bernard Geenen, REOSC (France)


Published in SPIE Proceedings Vol. 3244:
Laser-Induced Damage in Optical Materials: 1997
Gregory J. Exarhos; Arthur H. Guenther; Mark R. Kozlowski; M. J. Soileau, Editor(s)

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