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Proceedings Paper

Surface relief gratings in self-developing photopolymer films
Author(s): Rene M. Beaulieu; Roger A. Lessard; Michel Bolte; Detlef Kip
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Paper Abstract

Dichromated poly(acrylic acid) (DCPAA) films with dimethyl formamide (DMF) have ben sued to photofabricate surface relief gratings. The formation of those gratings depends on the self-development time in darkness subsequent to the illumination at a wavelength of 442 nm and is obtained without any chemical treatment or wet processing. The modulation depth of those holographic surface relief gratings and the spatial frequency response of the thin DCPAA-DMF films have been chosen to characterize that self- developing photopolymer system. Those holographic characteristics are presented in this paper.

Paper Details

Date Published: 26 March 1998
PDF: 7 pages
Proc. SPIE 3294, Holographic Materials IV, (26 March 1998); doi: 10.1117/12.304515
Show Author Affiliations
Rene M. Beaulieu, Ctr. Specialise de Technologie Physique du Quebec (Canada)
Roger A. Lessard, COPL/Univ. Laval (Canada)
Michel Bolte, Univ. Blaise Pascal (France)
Detlef Kip, Univ. Osnabrueck (Germany)


Published in SPIE Proceedings Vol. 3294:
Holographic Materials IV
T. John Trout, Editor(s)

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