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Proceedings Paper

Electrostatically actuated stylus profiler with capacitive displacement sensing in vertical and lateral directions
Author(s): Mike D. Kearny; Burford J. Furman
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Paper Abstract

A new profiler is under development that uses a commercially available electrostatic device normally used for nanoindentation as its primary sensing element. The new profiler can measure the force applied to the sample and the displacement of the stylus tip in both the vertical (Z) and lateral (X) directions, while the tip is moved in the forward (Y) direction. The sensor has a range of 100 microns and a resolution of 0.2 nm in the Z and X directions. The sensor can measure the force between the tip and the sample with a resolution of 100 nN up to 10 mN. The sensor is normally used to measure indentation force and distance simultaneously during nanoindenting. The instrument allows the force between the stylus tip and the sample to be controlled to a predetermined level and records the displacement of the tip as it scans the sample. Windows based software allows the data to be analyzed for roughness and waviness. The sensor can also move the tip in a lateral (X) direction by applying an electrostatic force to the tip. Lateral motion allows scans to be taken parallel to one another within a 100 micron range. The instrument can be operated in this manner to produce a limited 3D scan of the surface. This instrument offers a low cost device capable of high-resolution profilometry and limited 3D scanning.

Paper Details

Date Published: 1 April 1998
PDF: 6 pages
Proc. SPIE 3275, Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, (1 April 1998); doi: 10.1117/12.304408
Show Author Affiliations
Mike D. Kearny, San Jose State Univ. (United States)
Burford J. Furman, San Jose State Univ. (United States)


Published in SPIE Proceedings Vol. 3275:
Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II
John C. Stover, Editor(s)

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