Share Email Print
cover

Proceedings Paper

Modeling of scatter from small pits of arbitrary shape
Author(s): Vladimir I. Ivakhnenko; Craig A. Scheer; John C. Stover
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Computer simulations of scatter from various surface features are very important for addressing the design issues associated with producing scanners to meet evolving industry needs. This paper deals with mathematical modeling of light scattering by small pits of arbitrary shape on the surface of silicon wafers. The code based on method of moments applied to the volume integral equation, has been developed, and the numerically modeled differential scattering cross- section is presented for various types of pits. Pit shape and orientation are investigated.

Paper Details

Date Published: 1 April 1998
PDF: 9 pages
Proc. SPIE 3275, Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II, (1 April 1998); doi: 10.1117/12.304396
Show Author Affiliations
Vladimir I. Ivakhnenko, ADE Optical Systems (United States)
Craig A. Scheer, ADE Optical Systems (United States)
John C. Stover, ADE Optical Systems (United States)


Published in SPIE Proceedings Vol. 3275:
Flatness, Roughness, and Discrete Defects Characterization for Computer Disks, Wafers, and Flat Panel Displays II
John C. Stover, Editor(s)

© SPIE. Terms of Use
Back to Top