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Proceedings Paper

Fabrication of multilevel HOEs using direct e-beam writing
Author(s): Aleksandr N. Palagushkin; M. V. Politov; Sergei A. Prokopenko; Andrei L. Mikaelian; A. N. Arlamenkov; Boris S. Kiselyov; Vladimir A. Shkitin
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Paper Abstract

The paper describes the method of HOE fabrication using direct exposure-controlled e-beam writing of binary and multilevel phase reliefs in a resist layer. Beamsplitters with diffraction efficiency of over 70% have been made using this technique.

Paper Details

Date Published: 10 March 1998
PDF: 7 pages
Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); doi: 10.1117/12.302511
Show Author Affiliations
Aleksandr N. Palagushkin, Institute of Optical Neural Technologies (Russia)
M. V. Politov, Institute of Optical Neural Technologies (Russia)
Sergei A. Prokopenko, Institute of Optical Neural Technologies (Russia)
Andrei L. Mikaelian, Institute of Optical Neural Technologies (Russia)
A. N. Arlamenkov, Institute of Optical Neural Technologies (Russia)
Boris S. Kiselyov, Institute of Optical Neural Technologies (Russia)
Vladimir A. Shkitin, Institute of Optical Neural Technologies (Russia)


Published in SPIE Proceedings Vol. 3348:
Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing
Andrei L. Mikaelian, Editor(s)

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