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Proceedings Paper

Accuracy potential of circular laser writing of DOEs
Author(s): Vadim V. Cherkashin; Andrey A. Kharissov; Victor Pavlovich Korolkov; Voldemar Petrovich Koronkevich; Alexander G. Poleshchuk
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Paper Abstract

The circular laser writing system for writing of arbitrary patterns of diffractive elements in chromium films and photoresists has been developed as an alternative method for laser or e-beam writing in x-y system of coordinates. This system is able to generate binary amplitude and continuous- tone patterns with features of less than 1 micrometers and accuracy of 0.1 micrometers on substrates up to 300 mm diameter. Construction of the circular laser writing system (CLWS) designed at the IA&E and writing strategies such as laser beam addressing in polar coordinate system are described. This article presents the overview and analysis of writing errors. The characteristics of zone plates and linear gratings fabrication and methods of errors measurement are given. The measurements of wavefront errors of binary f/1.1 zone plates and linear polar system gratings with period of less than 5 micrometers fabricated by CLWS demonstrate the high quality of writing strategy.

Paper Details

Date Published: 10 March 1998
PDF: 11 pages
Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); doi: 10.1117/12.302509
Show Author Affiliations
Vadim V. Cherkashin, Institute of Automation and Electrometry (Russia)
Andrey A. Kharissov, Institute of Automation and Electrometry (Russia)
Victor Pavlovich Korolkov, Institute of Automation and Electrometry (Russia)
Voldemar Petrovich Koronkevich, Institute of Automation and Electrometry (Russia)
Alexander G. Poleshchuk, Institute of Automation and Electrometry (Russia)


Published in SPIE Proceedings Vol. 3348:
Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing
Andrei L. Mikaelian, Editor(s)

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