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Proceedings Paper

Fabrication of 2D multilevel phase holographic beamsplitters using e-beam lithography
Author(s): Andrei L. Mikaelian; Sergei A. Prokopenko; Aleksandr N. Palagushkin
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Paper Abstract

The results of 2D multiple-levels phase holographic high efficiency laser beam-splitters computer design and fabrication using direct E-beam phase relief recording in E- resist layer, chemical and reactive ion etching processing are described. The good agreement between theory predictions and the performance of fabricated splitters for a visible range of waves is observed.

Paper Details

Date Published: 10 March 1998
PDF: 7 pages
Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); doi: 10.1117/12.302473
Show Author Affiliations
Andrei L. Mikaelian, Institute of Optical Neural Technologies (Russia)
Sergei A. Prokopenko, Institute of Optical Neural Technologies (Russia)
Aleksandr N. Palagushkin, Institute of Optical Neural Technologies (Russia)


Published in SPIE Proceedings Vol. 3348:
Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing

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