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Proceedings Paper

New approach for the fabrication of diffractive optical elements with rotationally symmetric phase distribution
Author(s): Yongtian Wang; Fang Cui; Yunan Sun; Dazun Zhao
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Paper Abstract

Diffractive optical elements (DOEs), especially those used in imaging systems, often have phase distributions of rotational symmetry. A metal mask is designed such that it has different open slit angles on different radii, and the angle on a specific radius is inversely proportional to the phase magnitude there. The substrate is placed immediately under this mask and rotated relative to it during ion etching. The amount of etching on different radii of the substrate is thus modulated by the mask, and the DOE is produced in a single step. Experiments show that this is a practical and low-cost manufacture method when the phase variation along the radius is not too rapid.

Paper Details

Date Published: 10 March 1998
PDF: 4 pages
Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); doi: 10.1117/12.302470
Show Author Affiliations
Yongtian Wang, Beijing Institute of Technology (China)
Fang Cui, Beijing Institute of Technology (China)
Yunan Sun, Beijing Institute of Technology (China)
Dazun Zhao, Beijing Institute of Technology (China)


Published in SPIE Proceedings Vol. 3348:
Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing
Andrei L. Mikaelian, Editor(s)

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