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Proceedings Paper

Least squares fitting of two planar point sets for use in photolithography overlay alignment
Author(s): Divyendu Sinha; Edward T. Polkowski
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Paper Abstract

Many automated processing systems used in semiconductor manufacturing perform an alignment of one pattern to another, or find the relationship between two coordinate systems by using pairs of measurements of points in both systems. This operation is also performed by other applications in robotics and image processing, such as the hand-eye transform and the stereo model for 3D-point estimation. This paper discusses the alignment and coordinate transform processes and the least squares criteria used in finding the best rotation, translation, and scale change for matching two point sets.

Paper Details

Date Published: 12 March 1998
PDF: 9 pages
Proc. SPIE 3303, Real-Time Imaging III, (12 March 1998); doi: 10.1117/12.302425
Show Author Affiliations
Divyendu Sinha, CUNY/College of Staten Island and Robotic Vision Systems, Inc. (United States)
Edward T. Polkowski, Robotic Vision Systems, Inc. (United States)


Published in SPIE Proceedings Vol. 3303:
Real-Time Imaging III
Divyendu Sinha, Editor(s)

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