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Proceedings Paper

Photochemical processes in photoresists containing electron donor molecules
Author(s): Antonina D. Grishina; Anatoly V. Vannikov; Galina O. Khazova; Marine G. Tedoradze; Yurij I. Koltsov
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Paper Abstract

It is shown that the addition of donors (D) into resists composition based on novolac resin and diazonaphthoquinone sulfonate (DQS) ensures the linear increase quantum yield of the DQS decomposition and the light-sensitivity of resist when the ionization potential of a donor decreases. These facts are explained by the exciplex D(DQS)* formation and its subsequent dissociation on unstable D+ and (DQS)- radical ions transforming into indene carboxylic acid.

Paper Details

Date Published: 1 January 1998
PDF: 4 pages
Proc. SPIE 3347, Optical Information Science and Technology (OIST97): Optical Recording Mechanisms and Media, (1 January 1998); doi: 10.1117/12.301424
Show Author Affiliations
Antonina D. Grishina, Institute of Electrochemistry (Russia)
Anatoly V. Vannikov, Institute of Electrochemistry (Russia)
Galina O. Khazova, Institute of Electrochemistry (Russia)
Marine G. Tedoradze, Institute of Electrochemistry (Russia)
Yurij I. Koltsov, Institute of Electrochemistry (Russia)


Published in SPIE Proceedings Vol. 3347:
Optical Information Science and Technology (OIST97): Optical Recording Mechanisms and Media
Andrei L. Mikaelian, Editor(s)

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