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Proceedings Paper

Software tool for temperature simulation in electron-beam lithography: TEMPTATION
Author(s): Sergey V. Babin; Igor Yu. Kuzmin; G. Sergeev
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Paper Abstract

Resist heating becomes a problem when using high-throughput electron-beam lithography (EBL). The TEMPTATION software tool was developed to simulate temperature change during electron- beam exposure. The software uses an original resist heating model that measures heat transfer through a multilayer resist and substrate. It has analytical formulas to provide fast numerical simulation of large patterns and a user-friendly Windows95 interface. The software is useful in the design of EBL systems and the development of new EBL processes.

Paper Details

Date Published: 12 February 1997
PDF: 7 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301219
Show Author Affiliations
Sergey V. Babin, Etec Systems, Inc. (United States)
Igor Yu. Kuzmin, Set-Service (Russia)
G. Sergeev, Set-Service (Russia)


Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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