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Proceedings Paper

Manufacture of photomasks for critical layers of sub-half-micron CMOS technology
Author(s): Brian Martin; Tim R. Waring
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Paper Abstract

Results are presented of dimensional measurements on 6 inch photomasks manufactured for the critical layers of a sub-half- micron CMOS process. Measurements show that dimensional control is excellent across individual plates but that capability indices are impaired by drift of mean-mean between individual photomasks. The measurement tool used was shown to be incapable of supporting the advanced manufacturing specification but its performance was improved by taking multi-point measurements.

Paper Details

Date Published: 12 February 1997
PDF: 10 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301201
Show Author Affiliations
Brian Martin, GEC Plessey Semiconductors Ltd. (United Kingdom)
Tim R. Waring, Photronics Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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