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Proceedings Paper

Initial characterization results of a low-voltage CD SEM for reticle metrology
Author(s): Rich Quattrini; Craig W. MacNaughton; Richard C. Elliott; Waiman Ng; Rohit Malhotra; Mohan Ananth; Jason C. Yee
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Paper Abstract

This paper presents results obtained using a low-voltage critical dimension scanning electron microscope (CD SEM) for the imaging and measurement of features patterned on quartz photomasks. The SEM system used was designed for handling silicon wafer substrates and has been adapted to accommodate 6', 250 mil photomask substrates. The scope for this initial characterization is limited to the two most common reticle metrology applications on current technology photomasks; patterned PBS photoresist features on chrome, and patterned chrome features on quartz. Images, data, and analysis of the characterization results are presented, and the unique difficulties of imaging and measurement of each of these two types of samples is discussed.

Paper Details

Date Published: 12 February 1997
PDF: 6 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301185
Show Author Affiliations
Rich Quattrini, KLA-Tencor Corp. (United States)
Craig W. MacNaughton, KLA-Tencor Corp. (United States)
Richard C. Elliott, KLA-Tencor Corp. (United States)
Waiman Ng, KLA-Tencor Corp. (United States)
Rohit Malhotra, KLA-Tencor Corp. (United States)
Mohan Ananth, KLA-Tencor Corp. (United States)
Jason C. Yee, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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