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Proceedings Paper

Printability and repair techniques for DUV photomasks
Author(s): Fritz Gans; Marion Jess; Stephanie Kohlpoth; Rainer Pforr
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Paper Abstract

Intention of this paper is to discuss some issues resulting from increasing requirements on mask making for 0.25 micrometer technology and below. The key question to be discussed is: How can zero defects masks be guaranteed in future and what efforts are needed to reach that goal. Using state of the art equipment two photomasks were manufactured with typical sized and shaped programmed defects. First, criteria is discussed to characterize the printability of mask defects. Key element is the aerial image measurements system MSM100/AIMS. As a result it was found that the criteria strongly depends on the principle shape of the considered pattern. It is shown that the standard criteria used for mask repair, i.e. relative change of the maximum feature image intensity, is only applicable in case of best dose and best focus. The results were used to improve the performance of an attenuated DUV phase-shifting-mask (aPSM). Various repair techniques have been studied. As a result it can be concluded that high quality mask repairs are available which allow the fabrication of defect free aPSM.

Paper Details

Date Published: 12 February 1997
PDF: 6 pages
Proc. SPIE 3236, 17th Annual BACUS Symposium on Photomask Technology and Management, (12 February 1997); doi: 10.1117/12.301183
Show Author Affiliations
Fritz Gans, Siemens Semiconductors (Germany)
Marion Jess, Siemens Semiconductors (Germany)
Stephanie Kohlpoth, Siemens Semiconductors (Germany)
Rainer Pforr, Simec (Germany)

Published in SPIE Proceedings Vol. 3236:
17th Annual BACUS Symposium on Photomask Technology and Management
James A. Reynolds; Brian J. Grenon, Editor(s)

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