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Proceedings Paper

PL study of QDs manufactured by visible light lithography and wet etching
Author(s): Xingquan Liu; Mingfang Wan; Bo Zhang; Xiaoshuang Chen; Wei Lu; Shuechu Shen
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Paper Abstract

Manufacture of AlGaAs/GaAs QDs by visible light lithography and etching is accomplished in this paper, and the size distribution is studied by smaill-spotted PL. The broadening of PL peaks which is caused by the fluctuation of quantum well is studied.

Paper Details

Date Published: 20 February 1998
PDF: 3 pages
Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); doi: 10.1117/12.300716
Show Author Affiliations
Xingquan Liu, Shanghai Institute of Technical Physics (China)
Mingfang Wan, Shanghai Institute of Technical Physics (China)
Bo Zhang, Shanghai Institute of Technical Physics (China)
Xiaoshuang Chen, Shanghai Institute of Technical Physics (China)
Wei Lu, Shanghai Institute of Technical Physics (China)
Shuechu Shen, Shanghai Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 3175:
Third International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang; Yi-Xin Chen; Shuzheng Mao, Editor(s)

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