Share Email Print
cover

Proceedings Paper

Simulation and testing of a vertical organometallic vapor phase epitaxy reactor
Author(s): R. A. Sani; M. Barmawi; J. Y. Mindara
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The purpose of the study is to design a single wafer vertical organo-metallic vapor phase epitaxy (OMVPE) reactor which gives a uniform deposition around the symmetry axis. The vertical reactor under the consideration consist of a diffuser and a system of coaxial cylinders to laminarize the flow which may lead to a uniform deposition without rotating the susceptor. The simulation shows that for a susceptor with a radius of 2.5 cm, a uniformity can be achieved in a region of a radius of 2 cm within 1% for certain operating condition. The result is compared with the experimental measurement of TiO2 deposition from TTIP.

Paper Details

Date Published: 20 February 1998
PDF: 3 pages
Proc. SPIE 3175, Third International Conference on Thin Film Physics and Applications, (20 February 1998); doi: 10.1117/12.300675
Show Author Affiliations
R. A. Sani, Institut Teknologi Bandung (Indonesia)
M. Barmawi, Institut Teknologi Bandung (Indonesia)
J. Y. Mindara, Institut Teknologi Bandung (Indonesia)


Published in SPIE Proceedings Vol. 3175:
Third International Conference on Thin Film Physics and Applications
Shixun Zhou; Yongling Wang; Yi-Xin Chen; Shuzheng Mao, Editor(s)

© SPIE. Terms of Use
Back to Top