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Proceedings Paper

Application of a reduced area electrical test pattern to precise pattern registration measurements
Author(s): James P. Rominger
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Paper Abstract

A new reduced area electrically probed registration measurement pattern is described. The pattern is compatible with the Prometrix data acquisition and analysis system, and offers advantages over standard patterns in terms of patten area and versatility of use. The results of the application of the pattern to the measurement of reticle and stepper overlay are presented. With careful analysis of the data, inter- and intrafield reticle overlay errors are determined. Horizontal and vertical measurements of pattern placement within a single field and between fields showed an accuracy of greater than 67 nm and a repeatability of better than 14 nm (3 sigma).

Paper Details

Date Published: 1 March 1991
PDF: 8 pages
Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); doi: 10.1117/12.29755
Show Author Affiliations
James P. Rominger, Ultratech Stepper Corp. (United States)


Published in SPIE Proceedings Vol. 1496:
10th Annual Symp on Microlithography
James N. Wiley, Editor(s)

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