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Proceedings Paper

Phase-shifting and other challenges in optical mask technology
Author(s): Burn Jeng Lin
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Paper Abstract

Optical lithography has benefitted from progresses in wavelength reduction, lenses, resist systems, alignment, focussing, table accuracy, and insute metrology. As a result, the minimum feature size of integrated circuits has been reduced through many generations from 2 micrometers to 0.5 micrometers in manufacturing. There are many opportunities in improving the mask to help continue the progress. The image contrast can be restored by reducing stray light with mask anti-reflection coating at the absorber-air interface. Pre-distorting the mask against the distortion of the imaging lens can drastically improve the overlay performance. Adjusting the gray level or the feature size individually according to the pattern proximity environment can create a larger common exposure-defocus window for different feature shapes. Introducing phase shifts in the mask can simultaneously improve resolution and depth of focus, with the potential of a two-generation improvement with any given projection imaging equipment, provided the overlay capability is upgraded accordingly. In addition to describing and comparing these opportunities, the phase-shifting technology is given a special focus on the working principle, the different approaches to phase shifting, their imaging characteristics in terms of exposure-defocus diagrams, a systems view, and the scope of its development.

Paper Details

Date Published: 1 March 1991
PDF: 26 pages
Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); doi: 10.1117/12.29751
Show Author Affiliations
Burn Jeng Lin, IBM Corp. (Taiwan)


Published in SPIE Proceedings Vol. 1496:
10th Annual Symp on Microlithography
James N. Wiley, Editor(s)

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