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Proceedings Paper

Sophisticated masks
Author(s): Roger Fabian W. Pease; Gerry Owen; Raymond Browning; Robert L. Hsieh; Julienne Yu-Hey Lee; Nadim I. Maluf; C. Neil Berglund
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Paper Abstract

Most photolithographic masks are made today using technology that has charged little from that licensed to the industry by Western Electric in 1975; even X-ray lithographic masks have changed little since then. This at first sight is extraordinary given that this same period spans the evolution of DRAMs by three orders of magnitude (from 4Kbit to 4M-bit) and the reduction of feature sizes nearly one order of magnitude.

Paper Details

Date Published: 1 March 1991
PDF: 5 pages
Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); doi: 10.1117/12.29747
Show Author Affiliations
Roger Fabian W. Pease, Stanford Univ. (United States)
Gerry Owen, Hewlett-Packard Co. (United States)
Raymond Browning, Stanford Univ. (United States)
Robert L. Hsieh, Stanford Univ. (United States)
Julienne Yu-Hey Lee, Stanford Univ. (United States)
Nadim I. Maluf, Stanford Univ. (United States)
C. Neil Berglund, Stanford Univ. (United States)


Published in SPIE Proceedings Vol. 1496:
10th Annual Symp on Microlithography
James N. Wiley, Editor(s)

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