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Proceedings Paper

What IS a phase-shifting mask?
Author(s): David Levenson
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Paper Abstract

The phase shifting mask is a two-layer engineered structure that improves the resolution of microlithography by between 25% and 100% by using interference to cancel some diffraction effects1,2. Although invented in 1980, this technology has only recently become prominent, mostly because of its potential to produce 16 Mb and 64 Mb DRAM with current i-line projection tools3,4. In the long run, phase-shifting masks may be used with deep-UV steppers to make structures with critical dimensions down to 0.15 micrometer.

Paper Details

Date Published: 1 March 1991
PDF: 7 pages
Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); doi: 10.1117/12.29740
Show Author Affiliations
David Levenson, Phase & Amplitude, Consultants (United States)


Published in SPIE Proceedings Vol. 1496:
10th Annual Symp on Microlithography
James N. Wiley, Editor(s)

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