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Proceedings Paper

New methods for measuring wave aberrations of high-quality imaging systems over an extended image field
Author(s): Ingolf Weingaertner; Michael Schulz; Stefan Loheide; Ludolf Schneider
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Paper Abstract

The quantitative determination of wave aberrations for high- quality imaging systems for off-axis use is an important challenge to modern optical measurement techniques. Several proposals in the conjunction with Twyman-Green interferometry and shearing interferometry will be made for this purpose. Two of these methods allow a reproducible and definitely quantitative alignment of the Twyman-Green set-up to be achieve. One method uses the point image for the positioning and the other that the front face of the Twyman sphere can be the first surface of a so-called adjustment system and that the Twyman sphere is in its correct position when the adjustment system reports that correct adjustment has been achieved. Another proposal concerns a shearing interferometer that consists of a combination of two conventional shearing interferometers and is capable of capturing the complete information about a wavefront by recording a single interferogram. Moreover a new method for quantitatively determining the shape of a wavefront from this interferogram will be presented, which requires nearly no a priori information about the shape of a wavefront to be calculated, leads to accurate results with high lateral resolution for relatively large shears, reconstructs the information inside the whole aperture, and requires much less computational effort than procedures hitherto known.

Paper Details

Date Published: 1 November 1997
PDF: 12 pages
Proc. SPIE 3134, Optical Manufacturing and Testing II, (1 November 1997); doi: 10.1117/12.295143
Show Author Affiliations
Ingolf Weingaertner, Physikalisch-Technische Bundesanstalt (Germany)
Michael Schulz, Physikalisch-Technische Bundesanstalt (Germany)
Stefan Loheide, Physikalisch-Technische Bundesanstalt (Germany)
Ludolf Schneider, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 3134:
Optical Manufacturing and Testing II
H. Philip Stahl, Editor(s)

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