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Proceedings Paper

New method to fabricate diffractive blazed gratings by anisotropic etching on (110) silicon wafers
Author(s): Lung Jieh Yang; Peizen Chang; Chih-Kung Lee; J.-T. Teng
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Paper Abstract

This paper describes a new method to fabricate the blazed gratings on oriented silicon by the anisotropic etching technique. Instead of making the multilevel gratings by the binary lithography or preparing the analog resist profiles by the e-beam direct-write, we propose a new sequence to obtain the blazed gratings with a continuous blaze surface. The key techniques include the oblique lapping/polishing and the time/portion control of potassium wet etching. This method has the advantages of easy facility, low cost, and large tolerance in gratings' design.

Paper Details

Date Published: 14 November 1997
PDF: 6 pages
Proc. SPIE 3242, Smart Electronics and MEMS, (14 November 1997); doi: 10.1117/12.293547
Show Author Affiliations
Lung Jieh Yang, Tamkang Univ. (Taiwan)
Peizen Chang, National Taiwan Univ. (Taiwan)
Chih-Kung Lee, National Taiwan Univ. (Taiwan)
J.-T. Teng, National Taiwan Univ. (Taiwan)


Published in SPIE Proceedings Vol. 3242:
Smart Electronics and MEMS
Alex Hariz; Vijay K. Varadan; Olaf Reinhold, Editor(s)

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