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Proceedings Paper

Bionanostructures built on e-beam-assisted functionalized polymer surfaces
Author(s): Dan V. Nicolau; Takahisa Taguchi; Mircea V. Dusa; Susumu Yoshikawa
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Paper Abstract

Electron-beam lithography employing poly(tert-Buthyl- Methacrylate)-co-(Methyl-Methacrylate) as radiation sensitive system was used to pattern bioactive molecules at super-high resolution. Positive and negative tone lithography succeed in printing fluorescent avidin into the range of 100 nm resolution. Two mechanisms were used for protein attachment, namely: (1) the linkage of the amino-end of the protein to the radiation-induced carboxylic acid sites, via NH2-to-COOH crosslinking mediated by carbodiimide; and (2) hydrophobic interaction between the patterned proteins and unexposed surfaces, in contrast to hydrophilic-repulsive interaction with exposed one. The first mechanism produces positive tone, half-tone images, while the second produces negative tone, sharp contrast images. On this basis, we assume that the first mechanism is concentration-controlled, while the second is an on-off one. This study proves that e-beam lithography materials and techniques can be easily transferred in bio- microlithography, with impact on biodevices fabrication and combinatorial chemistry.

Paper Details

Date Published: 14 November 1997
PDF: 6 pages
Proc. SPIE 3241, Smart Materials, Structures, and Integrated Systems, (14 November 1997); doi: 10.1117/12.293500
Show Author Affiliations
Dan V. Nicolau, Osaka National Research Institute (Japan)
Takahisa Taguchi, Osaka National Research Institute (Japan)
Mircea V. Dusa, National Semiconductor Corp. (United States)
Susumu Yoshikawa, Osaka National Research Institute (Japan)


Published in SPIE Proceedings Vol. 3241:
Smart Materials, Structures, and Integrated Systems
Alex Hariz; Vijay K. Varadan; Olaf Reinhold, Editor(s)

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