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Proceedings Paper

Titanium nitride film prepared by ion-beam-enhanced deposition
Author(s): Han-wei Liu; Zhidong Huang; Yuan-ru Chen
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Paper Abstract

The titanium nitride film has been synthesized by electron beam evaporation depositino f titanium and bombardment with a xenon ion beam in th environment of nitrogen gas. The component, valence state and structure of titanium nitride film ar analyzed by means of XPS, AES, and X-ray difraction. The reslts shows that th main cooposition of the film are titnaium nitride crystallites with preferentia orientatinslightly and fine gran size,exept predominant titanium oxide film on surface of thefilm and there exists a signficiant mixed layser of titanium, nitrogen and ferrum between the film and its matrix, whichplayed an important role for increasing adhesion between the film and substrate. finally, its some properties have been investigated.

Paper Details

Date Published: 14 November 1997
PDF: 4 pages
Proc. SPIE 3241, Smart Materials, Structures, and Integrated Systems, (14 November 1997); doi: 10.1117/12.293488
Show Author Affiliations
Han-wei Liu, Southwest Jiaotong Univ. (China)
Zhidong Huang, Chengdu Textile Industry College (China)
Yuan-ru Chen, Southwest Jiaotong Univ. (China)

Published in SPIE Proceedings Vol. 3241:
Smart Materials, Structures, and Integrated Systems
Alex Hariz; Vijay K. Varadan; Olaf Reinhold, Editor(s)

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