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Proceedings Paper

DC magnetron-sputtered molybdenum thin films for micromechanical structures
Author(s): Chee Yee Kwok; Tom Puzzer; Kwang Ming Lin; Jafar Haji-Babaei
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Paper Abstract

The suitability of refractory metal, molybdenum, as a material for microstructures in MEMS is explored in this paper. This paper describes the effects of dc magnetron sputtering conditions on the residual stress of the film. The effects of post deposition annealing as a means of stress relief are also reported. Post deposition annealing also addresses the problems of film adhesion. An example of the application of Mo is given in the form of a cantilever structure suspended over a silicon gap which involves both surface and bulk micromachining.

Paper Details

Date Published: 14 November 1997
PDF: 8 pages
Proc. SPIE 3241, Smart Materials, Structures, and Integrated Systems, (14 November 1997); doi: 10.1117/12.293487
Show Author Affiliations
Chee Yee Kwok, Univ. of New South Wales (Australia)
Tom Puzzer, Univ. of New South Wales (Australia)
Kwang Ming Lin, Mosel-Vitelic (Taiwan)
Jafar Haji-Babaei, Univ. of New South Wales (Australia)


Published in SPIE Proceedings Vol. 3241:
Smart Materials, Structures, and Integrated Systems
Alex Hariz; Vijay K. Varadan; Olaf Reinhold, Editor(s)

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