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Proceedings Paper

X-ray photoelectron spectroscopy with a laser plasma source
Author(s): Toshihisa Tomie; Hiroyuki Kondo; Hideaki Shimizu; Peixiang Lu
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Paper Abstract

For the study of future nm devices, electronic and chemical states must be observed with nm resolution, and a photoelectron microscope is strongly desired to be developed. A compact system for in-house analysis can be realized with a laser-plasma x-ray source. Experimental results confirm that an x-ray photoelectron microscope with a laser-plasma can become a powerful tool with potential spectrum acquisition time comparable to that with a synchrotron source. Reported are high energy resolution photoelectron spectra for Si revealing the existence of surface states, and 2-D mapping with resolution of 60 micrometers demonstrating that simultaneous detection of multi-elements by the time-of-flight energy analysis is powerful in obtaining a reliable mapping. High electron detection efficiency of the system with a pulse source is discussed to be essentially important for nm resolution.

Paper Details

Date Published: 14 October 1997
PDF: 8 pages
Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); doi: 10.1117/12.290265
Show Author Affiliations
Toshihisa Tomie, Electrotechnical Lab. (Japan)
Hiroyuki Kondo, Nikon Tsukuba Research Lab. (Japan)
Hideaki Shimizu, Electrotechnical Lab. (Japan)
Peixiang Lu, Electrotechnical Lab. (Japan)

Published in SPIE Proceedings Vol. 3157:
Applications of X Rays Generated from Lasers and Other Bright Sources
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

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