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Proceedings Paper

Low-debris laser plasma source
Author(s): Bo Chen; Jinquang Lin; Xin Zhang; Jianlin Cao
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Paper Abstract

In this paper we describe a low debris laser plasma source with cryogenic CO2 target developed in our institute, which can emit strong line radiation in EUV region even in water window. In particular the source is a very important candidate radiation source for the future EUV lithography production line.

Paper Details

Date Published: 14 October 1997
PDF: 4 pages
Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); doi: 10.1117/12.290264
Show Author Affiliations
Bo Chen, Changchun Institute of Optics and Fine Mechanics (China)
Jinquang Lin, Changchun Institute of Optics and Fine Mechanics (China)
Xin Zhang, Changchun Institute of Optics and Fine Mechanics (China)
Jianlin Cao, Changchun Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 3157:
Applications of X Rays Generated from Lasers and Other Bright Sources
George A. Kyrala; Jean-Claude J. Gauthier, Editor(s)

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