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Proceedings Paper

Compact electrostatic lithography column for nanoscale exposure
Author(s): Tom Chisholm; Haoning Liu; Eric Munro; John A. Rouse; Xieqing Zhu
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Paper Abstract

This paper describes an all-electrostatic electron-beam column which uses conventional electrode assemblies, resulting in a system which is very much smaller than a magnetic lens column. Computer modeling of the electron-optical performance of the column has shown that the concept has promise as a lithography tool. Beam broadening due to electron-electron interactions and aberrations of the final accelerating lens are both small enough to give a resolution which matches that of present-day magnetic columns.

Paper Details

Date Published: 25 September 1997
PDF: 9 pages
Proc. SPIE 3155, Charged Particle Optics III, (25 September 1997); doi: 10.1117/12.287810
Show Author Affiliations
Tom Chisholm, Leica Lithography Systems Ltd. (United Kingdom)
Haoning Liu, Munro's Electron Beam Software Ltd. (United Kingdom)
Eric Munro, Munro's Electron Beam Software Ltd. (United Kingdom)
John A. Rouse, Munro's Electron Beam Software Ltd. (United Kingdom)
Xieqing Zhu, Munro's Electron Beam Software Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 3155:
Charged Particle Optics III
Eric Munro, Editor(s)

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