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Proceedings Paper

DESIRE technology with electron-beam resists: fundamentals, experiments, and simulation
Author(s): Dan V. Nicolau; Florin Fulga; Mircea V. Dusa
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Paper Abstract

The paper deals with the application of DESIRE techniques on e-beam lithography. The authors propose the basic statements for designing e-beam resists in order to apply properly the silylation method. The preliminary experiments with the designed resist prove the silylation capabilities of PMMA/P(tert-Butyl)MA copolymer. A mathematical model is built which emphasizes the role of Tg in diffusion. The simulation results are presented.

Paper Details

Date Published: 1 August 1991
PDF: 7 pages
Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.28466
Show Author Affiliations
Dan V. Nicolau, ICCE (Romania)
Florin Fulga, ICCE (Romania)
Mircea V. Dusa, SEEQ Technology (United States)


Published in SPIE Proceedings Vol. 1465:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing
Martin C. Peckerar, Editor(s)

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