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Proceedings Paper

Flexible data registration and automation in semiconductor production
Author(s): Ralf Dudde; Peter Staudt-Fischbach; Benedict Kraemer
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Paper Abstract

The need for cost reduction and flexibility in semiconductor production will result in a wider application of computer based automation systems. With the setup of a new and advanced CMOS semiconductor line in the Fraunhofer Institute for Silicon Technology [ISIT, Itzehoe (D)] a new line information system (LIS) was introduced based on an advanced model for the underlying data structure. This data model was implemented into an ORACLE-RDBMS. A cellworks based system (JOSIS) was used for the integration of the production equipment, communication and automated database bookings and information retrievals. During the ramp up of the production line this new system is used for the fab control. The data model and the cellworks based system integration is explained. This system enables an on-line overview of the work in progress in the fab, lot order history and equipment status and history. Based on this figures improved production and cost monitoring and optimization is possible. First examples of the information gained by this system are presented. The modular set-up of the LIS system will allow easy data exchange with additional software tools like scheduler, different fab control systems like PROMIS and accounting systems like SAP. Modifications necessary for the integration of PROMIS are described.

Paper Details

Date Published: 25 August 1997
PDF: 11 pages
Proc. SPIE 3213, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III, (25 August 1997); doi: 10.1117/12.284635
Show Author Affiliations
Ralf Dudde, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)
Peter Staudt-Fischbach, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)
Benedict Kraemer, TEMIC SEMICONDUCTOR Itzehoe (Germany)

Published in SPIE Proceedings Vol. 3213:
Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III
Abe Ghanbari; Anthony J. Toprac, Editor(s)

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