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Proceedings Paper

Engineering tool set for monolithic and hybrid microsystem design
Author(s): H. Boutamine; Jean Michel Karam; Bernard Courtois; P. Drake; J. Oudinot; H. El Tahawi; Ariel D. Cao; Marta Rencz; Andras Poppe; Vladimir Szekely
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Paper Abstract

In this paper, we report on the recent advances in building an integrated environment for the design and simulation of microsystems based on commercially available CAD tools. The environment allows a continuous design flow from front-end to back-end for both monolithic and hybrid microsystems. Based on the FEM simulation results in a pre-design phase, simulation models of available standard components are developed in a system level and coupled to layout generators. A multi-level, mixed-mode, multi-technology simulation is ensured and a schematic driven layout is generated. Tools for anisotropic etching simulation are integrated in order to predict the etching procedure of full-custom microstructures.

Paper Details

Date Published: 2 September 1997
PDF: 9 pages
Proc. SPIE 3225, Microlithography and Metrology in Micromachining III, (2 September 1997); doi: 10.1117/12.284556
Show Author Affiliations
H. Boutamine, TIMA (France)
Jean Michel Karam, TIMA (France)
Bernard Courtois, TIMA (France)
P. Drake, Mentor Graphics (United States)
J. Oudinot, Mentor Graphics (United States)
H. El Tahawi, Mentor Graphics (United States)
Ariel D. Cao, Mentor Graphics (United States)
Marta Rencz, Technical Univ. of Budapest (Hungary)
Andras Poppe, Technical Univ. of Budapest (Hungary)
Vladimir Szekely, Technical Univ. of Budapest (Hungary)


Published in SPIE Proceedings Vol. 3225:
Microlithography and Metrology in Micromachining III
Craig R. Friedrich; Akira Umeda, Editor(s)

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