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Proceedings Paper

High-precision positioning stages for micro- and nanolithography
Author(s): Donald Croft; Santosh Devasia
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Paper Abstract

Low scanning speed as well as hysteresis nonlinearities have been fundamental limitations of scanning probe based micro/nano-fabrication techniques. Scanning speeds are typically limited to about 1/10th the fundamental vibrational mode of the piezo-positioning system while hysteresis nonlinearities cause significant errors in large- range positioning applications. This paper presents a method to achieve higher scan rates by using inversion of the piezo-actuator dynamics as well as by compensating for the hysteresis nonlinearities. The approach decouples the inversion into (a) inversion of the hysteresis nonlinearities and (b) inversion of the structural dynamics, to find an input voltage profile that achieves precision tracking of a desired scan trajectory. The results show that an order of magnitude increase in scanning speed is achieved, while maintaining precision tracking of the desired scan path.

Paper Details

Date Published: 2 September 1997
PDF: 8 pages
Proc. SPIE 3225, Microlithography and Metrology in Micromachining III, (2 September 1997); doi: 10.1117/12.284555
Show Author Affiliations
Donald Croft, Univ. of Utah (United States)
Santosh Devasia, Univ. of Utah (United States)


Published in SPIE Proceedings Vol. 3225:
Microlithography and Metrology in Micromachining III
Craig R. Friedrich; Akira Umeda, Editor(s)

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