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Proceedings Paper

Cost-effective mask fabrication on Kapton membrane for deep x-ray lithography
Author(s): Stefan Stadler; I. Derhalli; Chantal G. Khan Malek
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Paper Abstract

A low-cost mask fabrication process for deep x-ray lithography is described. The mask consists of Kapton films stretched on a ring with absorber structures formed by optical lithography using NFR015 resist and gold electroplating, similar to the masks from the 'early x-ray lithography age'. Such masks proved easy to fabricate and are presently being evaluated for deep x-ray lithography applications. First experiments indicate that they exhibit sufficient radiation resistance and limited variational dimensional changes during exposure at 1.3-1.5 GeV on the XRLM3 beamline at CAMD.

Paper Details

Date Published: 2 September 1997
PDF: 7 pages
Proc. SPIE 3225, Microlithography and Metrology in Micromachining III, (2 September 1997); doi: 10.1117/12.284546
Show Author Affiliations
Stefan Stadler, Louisiana State Univ. (United States)
I. Derhalli, Louisiana State Univ. (United States)
Chantal G. Khan Malek, Louisiana State Univ. (United States)

Published in SPIE Proceedings Vol. 3225:
Microlithography and Metrology in Micromachining III
Craig R. Friedrich; Akira Umeda, Editor(s)

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