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Proceedings Paper

Microfabrication by through-mask electrochemical micromachining
Author(s): Madhav Datta
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Paper Abstract

Patterning of thin films or foils by wet etching generally involves selective material removal through photoresist masks. Compared to the commonly employed chemical etching process, the electrochemical method of metal removal offers better control and flexibility for microfabrication. Other advantages include higher machining rate, the use of non-toxic and non- corrosive electrolyte and the possibility of machining a wide range of electrically conducting materials. Electrochemical metal removal (electrochemical micromachining) is now receiving attention in the electronics and other high-tech industries as a greener processing technology for microfabrication. Several examples of the application of electrochemical micromachining are presented in this paper. These examples demonstrate the challenges and opportunities offered by electrochemical metal removal in microfabrication.

Paper Details

Date Published: 5 September 1997
PDF: 7 pages
Proc. SPIE 3223, Micromachining and Microfabrication Process Technology III, (5 September 1997); doi: 10.1117/12.284478
Show Author Affiliations
Madhav Datta, IBM Thomas J. Watson Research Ctr. (United States)


Published in SPIE Proceedings Vol. 3223:
Micromachining and Microfabrication Process Technology III
Shih-Chia Chang; Stella W. Pang, Editor(s)

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